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Kelvin Probe Systems

KP Technology Ambient, Photovoltage, and UHV Kelvin Probe Systems

KP Technology offers a spectrum of dedicated kelvin probe systems specially developed for applications in a variety of environments, ranging from ambient, controlled atmosphere and relative humidity through to ultra-high vacuum. KP Technology is a world-leader in the exploration of future development pathways in specialist large scale scanning Kelvin probes, corrosion, polymer electronics and biotechnology and we continue to explore and expand the frontiers of work function imaging to support our customers in their pioneering research. They can accommodate client choice of tip sizes, translator movement, port adaptors and non-standard mounting angles. KP Technology has substantial experience with atypical Kelvin probe applications such as high or low temperature, sample temperature ramping, and unusual suspension systems.

Models

Ambient

KP Technology Ambient

The Ambient-pressure Photoemission Spectroscopy (APS) systems are a recent addition to KP Technology's large surface analysis range. APS systems measure the absolute work function (Φ) of a material by photoemission in ambient conditions, no vacuum is required. The excitation range of APS is 3.4 eV to 7.0 eV, meaning that APS is capable of measuring the absolute work function of metals and the ionisation potential of semiconductors alongside measurement of the surface Fermi level with the Kelvin probe. If an SPV and SPS source is added to the APS system, the full bands of semiconductors can be measured in one complete desktop system; no other product in the world can do this.

FEATURES

  • Work function by photoemission in air
  • Density of states measurements
  • 3.4 eV to 7.0 eV energy range
  • Measurement of all semiconductor bands
  • Contact potential difference by Kelvin Probe

APPLICATIONS

  • Organic and non-organic semiconductors
  • Metals and metal alloys
  • Thin films and surface oxides
  • Solar cells and organic photovoltaics
  • Corrosion and nanotechnology

Ambient-Pressure Brochure

Surface Photovoltage

KP Technology Surface Photovoltage

The surface photovoltage spectroscopy modules are the perfect all-in-one solution for in-depth studies of light sensitive materials such as organic semiconductors, solar cells, or light sensitive dyes. The modules offer a comprehensive range of measurement modes including DC and AC surface photovoltage studies utilizing the built-in optical chopper. Total digital control of all parameters including light intensity and wavelength (400 - 700 nm: SPS030 or 400 - 1000 nm: SPS040) gives the opportunity to investigate and characterize the surface photovoltage and surface photovoltage spectroscopy properties of samples. The latest materials and applications highlighted in published papers includes, gold films, perovskite solar cells, titanium dioxide nanotubes, dye-sensitized solar cells, hybrid organic/inorganic photocathodes and tungsten trioxide.

FEATURES

  • 400 nm - 700 nm range
  • Intense white light Quartz Tungsten Halogen (QTH) source
  • DC and AC measurement modes
  • Compatible with all Kelvin Probe systems
  • 30 nm - 70 nm FWHM

APPLICATIONS

  • Organic and non-organic semiconductors
  • Metal alloys and metal oxides
  • Thin films and surface oxides
  • Solar cells and organic photovoltaics
  • Nanotechnology

Surface Photovoltage Brochure

Single-Point

KP Technology Single-Point

KP Technology's single-point Kelvin probe (KP020) system is the introductory system to the KP Technology range. The off-null signal detection method allows very high-quality measurements of the work function (Φ) and Fermi level of materials. The economic system enables users to quickly record single point data and the dedicated software allows full digital control of all parameters to match the exact requirements of the sample under investigation. The recorded data is easily exportable to analysis software. For rapid events, the KP020 can record work function at a rate of over 300 work function measurements per minute, or alternatively, the system will track slow work function evolution over a number of days. There is an in-built height regulation feature to control the tip to sample spacing during measurements which gives rise to stable, reliable and repeatable data.

FEATURES

  • Work function measurement
  • Work function resolution of 1-3 meV
  • Manual X, Y, Z translator
  • Economical entry system
  • Off-null signal detection system

APPLICATIONS

  • Organic and non-organic semiconductors
  • Metals and metal alloys
  • Thin films and surface oxides
  • Solar cells and organic photovoltaics
  • Nanotechnology
  • Corrosion

Single-Point Brochure

Scanning Probe

KP Technology Scanning Probe

KP Technology's large range of Scanning Kelvin Probes give the user full access to 2D and 3D work function plots of samples ranging in size from 50 mm to 350mm. With work function resolution of 1-3 meV, and the spatial resolution of the probe tip diameter, the Scanning Kelvin Probe gives reliable, repeatable measurements for work function (Φ) and contact potential difference (CPD) measurements. Effects of corrosion can be measured across a surface with high precision (e.g. coating uniformity and performance). A Faraday enclosure shields all of our scanning systems from unwanted ambient light, fast-changing environmental conditions, electromagnetic interference and provides the perfect platform for our Ambient-pressure Photoemission Spectroscopy (APS) and Surface Photovoltage add-on modules.

FEATURES

  • Work function measurement
  • Work function resolution of 1-3 meV
  • Scanning area from 50 mm2 to 350 mm2
  • Scanning resolution equal to tip diameter
  • Automatic height regulation
  • Tip diameter 2.00 mm or 0.05 mm (SKP5050)

APPLICATIONS

  • Organic and non-organic semiconductors
  • Metals and metal alloys
  • Thin films and surface oxides
  • Solar cells and photovoltaics
  • Corrosion and nanotechnology
  • Quality control

Scanning Probe Brochure

UHV

KP Technology UHV

Ultra-high Vacuum Kelvin Probes give the user full access to work function and contact potential difference (CPD) measurements under vacuum. Each system comes with a high-quality, manual, or motorized translator that enables reliable and accurate tip-to-sample positioning, and the unrivalled tracking system always holds the tip separation constant during the measurement. Even under vacuum, the work function resolution is 1 - 3 meV. The dedicated software allows full digital control of all parameters to match the exact requirements of the sample under investigation. The recorded data is easily exportable to analysis software.

The UHV Kelvin Probe can be mounted to the user's existing UHV chamber or KP Technology offers an elegant UHVKP cell system (UHVKP Corner Cube) that can be used for ambient, UHV or gaseous measurements. This cell is completely modular, and a host of additional extras can be added-on.

FEATURES

  • Work function resolution of 1-3 meV
  • Camera and monitor provided (cube system)
  • Gaseous or ambient measuring
  • Automatic height regulation
  • Modular system for upgrades and add-ons

APPLICATIONS

  • Organic and non-organic semiconductors
  • Metals and metal alloys
  • Thin films and surface oxides
  • Solar cells and organic photovoltaics
  • Corrosion

UHV Brochure

Supplier Info

KP Technology

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